Etching Tools

RIE Oxford Plasmalab 80+, Ar, O2

RIE Oxford Plasmalab 80+, BCl3, Cl2

RIE Oxford Plasmalab 100, cryo,
  CF4, CHF3, SF6, Cl2, Ar, O2,
  He-backside cooling.

UHV E-gun deposition / Ar Ion gun etching, "Sputnik"


Lecture about etching (limited access)

Lund Nanolab, 2017-11-15, sponsor Plasma-Therm.
Webmaster Albanova Nanofabrication Facility